Invention Application
- Patent Title: Floating gate having enhanced charge retention
- Patent Title (中): 浮动门具有增强的电荷保持
-
Application No.: US10932198Application Date: 2004-09-01
-
Publication No.: US20060043463A1Publication Date: 2006-03-02
- Inventor: Chi-Wen Liu , Kuo-Ching Chiang , Horng-Huei Tseng , Wen-Tin Chu
- Applicant: Chi-Wen Liu , Kuo-Ching Chiang , Horng-Huei Tseng , Wen-Tin Chu
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Main IPC: H01L29/788
- IPC: H01L29/788

Abstract:
A semiconductor device includes a source and a drain formed in a substrate, a tunneling dielectric formed on the substrate between the source and the drain, and a floating gate disposed over the tunneling dielectric having a band-gap energy less than the energy band-gap of silicon.
Information query
IPC分类: