发明申请
- 专利标题： Alignment apparatus, exposure apparatus and device fabrication method
- 专利标题（中）： 对准装置，曝光装置和装置制造方法
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申请号： US11214252申请日： 2005-08-29
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公开(公告)号： US20060044538A1公开(公告)日： 2006-03-02
- 发明人: Mitsuaki Amemiya , Masahito Shinohara
- 申请人： Mitsuaki Amemiya , Masahito Shinohara
- 优先权： JP2004-253185 20040831
- 主分类号： G03B27/52
- IPC分类号： G03B27/52
摘要：
An alignment apparatus for aligning with each other a mask stage that supports a mask that has an exposure pattern and a wafer stage that supports an object by using a light with wavelength of 1 nm to 50 nm, said alignment apparatus including a substrate for forming a first reference pattern similar to a second reference pattern formed on the mask or the mask stage, and a detection part for detecting a light from the substrate, wherein said substrate and detection part form a hollow housing, in which a gas is filled.
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