Invention Application
- Patent Title: Thin film magnetic head structure, method of manufacturing the same, and method of manufacturing thin film magnetic head
- Patent Title (中): 薄膜磁头结构及其制造方法以及制造薄膜磁头的方法
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Application No.: US11206102Application Date: 2005-08-18
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Publication No.: US20060044683A1Publication Date: 2006-03-02
- Inventor: Naoto Matono , Osamu Fukuroi , Quan Wang
- Applicant: Naoto Matono , Osamu Fukuroi , Quan Wang
- Applicant Address: CN Hong Kong
- Assignee: SAE MAGNETICS (H.K.) LTD.
- Current Assignee: SAE MAGNETICS (H.K.) LTD.
- Current Assignee Address: CN Hong Kong
- Priority: JP2004-254666 20040901
- Main IPC: G11B5/147
- IPC: G11B5/147

Abstract:
The present invention provides a method of manufacturing a thin film magnetic head in which MR height and neck height can be determined with high precision. A plurality of thin film magnetic head bars are formed so as to include a plurality of thin film magnetic head precursors, a plurality of RLG sensors for reproducing head portions, and a plurality of RLG sensors for recording head portions. While detecting electrical resistance values of resistance films by using the RLG sensors for the reproducing head portions, the thin film magnetic head bar is pre-polished. Electrical resistance values of the resistance films are detected by using both of the RLG sensors for the reproducing head portions and the RLG sensors for the recording head portions and a tilt of a polished surface of the thin film magnetic head bar is adjusted. After that, while detecting the electrical resistance values of the resistance films by using the RLG sensors for the reproducing head portions again, the thin film magnetic head bar is finish-polished, thereby forming an air bearing surface.
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