Invention Application
US20060046475A1 Sloped vias in a substrate, spring-like deflecting contacts, and methods of making
有权
衬底中的斜槽,弹簧状偏转触点,以及制作方法
- Patent Title: Sloped vias in a substrate, spring-like deflecting contacts, and methods of making
- Patent Title (中): 衬底中的斜槽,弹簧状偏转触点,以及制作方法
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Application No.: US10933847Application Date: 2004-09-02
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Publication No.: US20060046475A1Publication Date: 2006-03-02
- Inventor: James Wark , Syed Ahmad
- Applicant: James Wark , Syed Ahmad
- Main IPC: H01L21/44
- IPC: H01L21/44

Abstract:
Methods for forming vias are disclosed. The methods include providing a substrate having a first surface and an opposing, second surface. The vias are formed within the substrate to have a longitudinal axis sloped at an angle with respect to a reference line extending perpendicular to the first surface and the second surface of the substrate. The vias may be formed from the first surface to the opposing second surface, or the via may be formed as a first blind opening from the first surface, then a second opening may be formed from the second surface to be aligned with the first opening. Vias may be formed completely through a first substrate and a second substrate, and the substrates may be bonded together. Semiconductor devices including the vias of the present invention are also disclosed. A method of forming spring-like contacts is also disclosed.
Public/Granted literature
- US07390740B2 Sloped vias in a substrate, spring-like contacts, and methods of making Public/Granted day:2008-06-24
Information query
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