发明申请
- 专利标题: Apparatus for processing substrates
- 专利标题(中): 用于处理衬底的设备
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申请号: US11253029申请日: 2005-10-17
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公开(公告)号: US20060048895A1公开(公告)日: 2006-03-09
- 发明人: Takayuki Suzuki , Masahiro Nakamura , Tsuyoshi Wakahira , Hideo Kobayashi
- 申请人: Takayuki Suzuki , Masahiro Nakamura , Tsuyoshi Wakahira , Hideo Kobayashi
- 专利权人: Origin Electric Company, Limited
- 当前专利权人: Origin Electric Company, Limited
- 优先权: JP2003-433599 20031226
- 主分类号: B32B37/00
- IPC分类号: B32B37/00 ; B32B41/00
摘要:
A processing apparatus for substrates that include a plurality of individual substrates having a photo-curable adhesive layer interposed therebetween, including a mounting table, an irradiating device that irradiates the substrates, and a control device that controls the deflection of the substrates (X) while the individual substrates are bonded together by photo-curing the adhesive. The control device calculates a temperature difference ΔT between the temperature Th of the mounting table and the temperature Td of the substrates before curing, finds a deflection difference ΔX between the deflection X of the substrates after curing and the target deflection setting value Xt, finds a temperature Tc by calculating Tc=ΔT−M×ΔX using the constant of proportionality M; and controls the temperatures of at least one of the substrates before curing and the mounting table according to the temperature Tc such that Tc=Th−Td.
公开/授权文献
- US07044183B2 Apparatus for processing substrates 公开/授权日:2006-05-16
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