发明申请
- 专利标题: Method of manufacturing lithographic printing plate support
- 专利标题(中): 平版印刷版支架的制造方法
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申请号: US11221720申请日: 2005-09-09
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公开(公告)号: US20060049037A1公开(公告)日: 2006-03-09
- 发明人: Atsuo Nishino , Yoshinori Hotta , Hirokazu Sawada , Akio Uesugi
- 申请人: Atsuo Nishino , Yoshinori Hotta , Hirokazu Sawada , Akio Uesugi
- 专利权人: FUJI PHOTO FILM CO., LTD.
- 当前专利权人: FUJI PHOTO FILM CO., LTD.
- 优先权: JP2004-261966 20040909
- 主分类号: C25D5/22
- IPC分类号: C25D5/22 ; C25D5/44
摘要:
Disclosed is a method of manufacturing a lithographic printing plate support, including a step of subjecting an aluminum plate to at least: a mechanical graining treatment using a brush and a slurry containing an abrasive to carry out mechanical graining such that the average surface roughness Ra is 0.25 μm or more but less than 0.40 μm, and an electrochemical graining treatment for carrying out electrochemical graining in an aqueous solution containing hydrochloric acid such that the average surface roughness Ra is 0.40 to 0.55 μm, with the treatments being performed in this order, so as to obtain a lithographic printing plate support. By this method, a lithographic printing plate support which can be used for a presensitized plate of high sensitivity which has both an excellent scumming resistance and a good press life when made into a lithographic printing plate is obtained.
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