发明申请
- 专利标题： Exposure apparatus, exposure method, and device manufacturing method
- 专利标题（中）： 曝光装置，曝光方法和装置制造方法
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申请号： US11215021申请日： 2005-08-31
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公开(公告)号： US20060050256A1公开(公告)日： 2006-03-09
- 发明人: Yuichi Takamura
- 申请人： Yuichi Takamura
- 申请人地址： JP Tokyo
- 专利权人： CANON KABUSHIKI KAISHA
- 当前专利权人： CANON KABUSHIKI KAISHA
- 当前专利权人地址： JP Tokyo
- 优先权： JP2004-257418 20040903
- 主分类号： G03B27/52
- IPC分类号： G03B27/52 ; G03B27/42
摘要：
An exposure apparatus is provided which has an optical system for projecting a pattern of an original onto a substrate and projects the pattern onto the substrate with a space between the optical system and the substrate filled with liquid. The apparatus includes a supply unit, having a nozzle, to supply liquid into the space through the nozzle, and a suppressing unit to suppress leakage of liquid from the nozzle.
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