发明申请
- 专利标题: Polarizing reticle
- 专利标题(中): 极化掩模版
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申请号: US11032916申请日: 2005-01-11
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公开(公告)号: US20060050389A1公开(公告)日: 2006-03-09
- 发明人: Ki Yang , Chun Kang
- 申请人: Ki Yang , Chun Kang
- 申请人地址: KR Kyungki-Do
- 专利权人: HYNIX SEMICONDUCTOR INC.
- 当前专利权人: HYNIX SEMICONDUCTOR INC.
- 当前专利权人地址: KR Kyungki-Do
- 优先权: KR2004-70930 20040906
- 主分类号: G02B5/30
- IPC分类号: G02B5/30
摘要:
A polarizing reticle including a transparent substrate, a polarizing filter formed over the transparent substrate, and a mask pattern formed on the polarizing filter. The polarizing reticle can polarize illumination light incident thereto in a desired direction in a photolithography process.