Invention Application
- Patent Title: Plasma-assisted sintering
- Patent Title (中): 等离子体辅助烧结
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Application No.: US10513305Application Date: 2003-05-07
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Publication No.: US20060057016A1Publication Date: 2006-03-16
- Inventor: Devendra Kumar , Satyendra Kumar
- Applicant: Devendra Kumar , Satyendra Kumar
- International Application: PCT/US03/14054 WO 20030507
- Main IPC: B22F3/105
- IPC: B22F3/105

Abstract:
Methods and systems for plasma-assisted sintering are provided. The method can include initiating a sintering plasma with a cavity (12) by subjecting a gas to radiation in the presence of a plasma catalyst and exposing at least a portion of an object which can be a powdered material component to the plasma for a period of time sufficient to sinter at least a portion of the object.
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