发明申请
US20060057494A1 Photoresist monomer having spiro cyclic ketal goup, polymer thereof and photoresit composition including the same
失效
具有螺环缩酮羧酸的光阻单体，其聚合物和含有它们的光致抗蚀剂组合物
- 专利标题： Photoresist monomer having spiro cyclic ketal goup, polymer thereof and photoresit composition including the same
- 专利标题（中）： 具有螺环缩酮羧酸的光阻单体，其聚合物和含有它们的光致抗蚀剂组合物
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申请号： US11227877申请日： 2005-09-15
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公开(公告)号： US20060057494A1公开(公告)日： 2006-03-16
- 发明人: Jae-Woo Lee , Jung-Youl Lee , Deog-Bae Kim , Jae-Hyun Kim , Eun-Kyung Son
- 申请人： Jae-Woo Lee , Jung-Youl Lee , Deog-Bae Kim , Jae-Hyun Kim , Eun-Kyung Son
- 专利权人： Dongjin Semichem Co., LTD.
- 当前专利权人： Dongjin Semichem Co., LTD.
- 优先权： KR10-2004-0073989 20040915; KR10-2005-0049720 20050610
- 主分类号： G03C1/76
- IPC分类号： G03C1/76
摘要：
A photoresist polymer having a spiro cyclic ketal group, and a photoresist composition including the same is disclosed. The photoresist polymer and the photoresist composition can improve the resolution and the process margin due to its low activation energy of the deprotection reaction of the spiro cyclic ketal group, and can produce fine photoresist patterns due to its low PEB(Post Exposure Baking) temperature sensitivity.
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