发明申请
- 专利标题： Antireflective compositions for photoresists
- 专利标题（中）： 用于光致抗蚀剂的抗反射组合物
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申请号： US11159002申请日： 2005-06-22
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公开(公告)号： US20060058468A1公开(公告)日： 2006-03-16
- 发明人: Hengpeng Wu , Shuji Ding-Lee , Zhong Xiang , Aritaka Hishida , Jianhui Shan , Hong Zhuang
- 申请人： Hengpeng Wu , Shuji Ding-Lee , Zhong Xiang , Aritaka Hishida , Jianhui Shan , Hong Zhuang
- 主分类号： C08F8/00
- IPC分类号： C08F8/00
摘要：
The present invention relates to a coating solution comprising a polymer obtained by reacting a glycoluril compound with at least one reactive compound containing at least one hydroxy group and/or at least one acid group, and further where the polymer is soluble in an organic solvent. The invention also relates to a process for imaging a photoresist coated over such a coating composition and to a polymer for the coating composition.
公开/授权文献
- US07691556B2 Antireflective compositions for photoresists 公开/授权日：2010-04-06
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