发明申请
- 专利标题: Method for reducing pole height loss in the formation of a write pole for a magnetic write head
- 专利标题(中): 降低写入磁头写磁极的磁极高度损失的方法
-
申请号: US10957038申请日: 2004-09-30
-
公开(公告)号: US20060070232A1公开(公告)日: 2006-04-06
- 发明人: Daniel Bedell , Jennifer Loo , Aron Pentek , Murali Ramasubramanian
- 申请人: Daniel Bedell , Jennifer Loo , Aron Pentek , Murali Ramasubramanian
- 主分类号: G11B5/187
- IPC分类号: G11B5/187
摘要:
A method for reducing plated pole height loss in the formation of a write pole for a magnetic write head is disclosed. The method includes forming a conductive layer on a thin film substrate, forming a photoresist layer on the conductive layer and forming a trench in the photoresist layer. A thick seed layer is then placed on the trench and on the photoresist layer surface using a collimator. Moreover, the process includes plating while applying a voltage to the thin film substrate where the electrically isolated seed layer is removed and the trench is filled with plating material, removing the photoresist layer, and removing the exposed portions of the conductive layer on the thin film substrate.
公开/授权文献
信息查询
IPC分类: