发明申请
US20060071164A1 Characterizing dimensions of structures via scanning probe microscopy 有权
通过扫描探针显微镜表征结构尺寸

Characterizing dimensions of structures via scanning probe microscopy
摘要:
A method comprising characterizing the dimensions of structures on a semiconductor device having dimensions less than approximately 100 nanometers (nm) using one of scanning probe microscopy (SPM) or profilometry.
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