Invention Application
- Patent Title: Test structures for feature fidelity improvement
- Patent Title (中): 测试结构,提高了功能的保真度
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Application No.: US10955748Application Date: 2004-09-30
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Publication No.: US20060075366A1Publication Date: 2006-04-06
- Inventor: Seongtae Jeong , Yan Borodovsky
- Applicant: Seongtae Jeong , Yan Borodovsky
- Main IPC: G06F17/50
- IPC: G06F17/50 ; G06F9/455

Abstract:
Systems and techniques for generating test structures. The test structures may conform to a set of design rules for a portion of an integrated circuit design. The test structures may include base figures, which may be in an enriched environment. For example, the test structures may include one or more additional figures such as surrounding figures, external figures, and/or symmetric figures. A correction algorithm for correcting a layout may be checked using a plurality of the test structures.
Public/Granted literature
- US07254803B2 Test structures for feature fidelity improvement Public/Granted day:2007-08-07
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