发明申请
US20060075967A1 Magnetic-field concentration in inductively coupled plasma reactors
审中-公开
电感耦合等离子体反应堆中的磁场浓度
- 专利标题： Magnetic-field concentration in inductively coupled plasma reactors
- 专利标题（中）： 电感耦合等离子体反应堆中的磁场浓度
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申请号： US10963030申请日： 2004-10-12
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公开(公告)号： US20060075967A1公开(公告)日： 2006-04-13
- 发明人: Siqing Lu , Canfeng Lai , Qiwei Liang , Maolin Long , Irene Chou , Jason Bloking , Steven Kim , Ellie Yieh
- 申请人： Siqing Lu , Canfeng Lai , Qiwei Liang , Maolin Long , Irene Chou , Jason Bloking , Steven Kim , Ellie Yieh
- 申请人地址： US CA Santa Clara
- 专利权人： APPLIED MATERIALS, INC.
- 当前专利权人： APPLIED MATERIALS, INC.
- 当前专利权人地址： US CA Santa Clara
- 主分类号： H01L21/20
- IPC分类号： H01L21/20 ; C23C16/00
摘要：
A substrate processing system is provided with a housing defining a process chamber. A substrate holder is disposed within the process chamber and configured to support a substrate during substrate processing. A gas delivery system is configured to introduce a gas into the process chamber. A pressure-control system is provided for maintaining a selected pressure within the process chamber. A high-density-plasma generating system is operatively coupled with the process chamber and includes a coil for inductively coupling energy into a plasma formed within the process chamber. It also includes magneto-dielectric material proximate the coil for concentrating a magnetic field generated by the coil. A controller is also provided for controlling the gas-delivery system, the pressure-control system, and the high-density-plasma generating system.