发明申请
- 专利标题： Composition for the removing of sidewall residues
- 专利标题（中）： 用于去除侧壁残留物的组合物
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申请号： US10518463申请日： 2003-05-27
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公开(公告)号： US20060086372A1公开(公告)日： 2006-04-27
- 发明人: Raimund Mellies , Marc Boerner , Lucia Arnold , Andrea Barko , Rudolf Rhein
- 申请人： Raimund Mellies , Marc Boerner , Lucia Arnold , Andrea Barko , Rudolf Rhein
- 优先权： DE10227867.9 20020622
- 国际申请： PCT/EP03/05549 WO 20030527
- 主分类号： B08B6/00
- IPC分类号： B08B6/00
摘要：
The present invention relates to a composition for the removal of so-called “sidewall residues” from metal surfaces, in particular from aluminium or aluminium-containing surfaces, in particular from aluminium or aluminium-containing surfaces, during the production of semiconductor elements.
公开/授权文献
- US07417016B2 Composition for the removing of sidewall residues 公开/授权日：2008-08-26
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