发明申请
- 专利标题： Optical component, optical system including such an optical component, lithographic apparatus, method of correcting apodization in an optical system, device manufacturing method, and device manufactured thereby
- 专利标题（中）： 光学部件，包括这种光学部件的光学系统，光刻设备，校正光学系统中的变迹的方法，器件制造方法和由此制造的器件
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申请号： US10976158申请日： 2004-10-29
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公开(公告)号： US20060091324A1公开(公告)日： 2006-05-04
- 发明人: Marcel Marie Dierichs
- 申请人： Marcel Marie Dierichs
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： G03F7/20
- IPC分类号： G03F7/20
摘要：
A method of correcting apodization in an optical system includes determining effects of apodization on an intensity distribution of a beam of radiation in a predetermined plane of the optical system; determining a more desirable intensity distribution of the beam of radiation in the predetermined plane such that apodization is corrected for; and absorbing portions of the beam of radiation in the predetermined plane as a function of location such that downstream from the predetermined plane the beam of radiation shows the more desirable intensity distribution. An optical component includes one or more absorbing layers designed to perform the absorption as a function of the location. The optical component may located in the pupil plane of the optical system.
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