摘要:
In immersion lithography, to avoid internal reflections in the final element of the projection system, immersion fluid and topcoat, the thicknesses, dl, dtc and dr, and refractive indices, nl, ntc and nr, of the immersion fluid, topcoat and resist may meet the following criteria: nl≦ntc≦nr dl>˜5.λ dtc≦˜5λ
摘要翻译:在浸没式光刻中,为了避免在投影系统的最终元件,浸没流体和面漆中的内部反射,厚度d 1,t 2和d 2 浸渍流体,面漆和抗蚀剂的折射率n 1,n 2,n 2和n 2的折射率可以满足 以下标准:<?in-line-formula description =“In-line Formulas”end =“lead”?> n sub> <= N sub> <= N r SUB> <?in-line-formula description =“In-line Formulas”end =“tail”?> <?in-line-formula description =“In-line Formulas”end =“lead”?> d sub>〜5.lambda <?in-line-formula description =“In-line Formulas”end =“tail”?> <?in-line-formula description =“在线公式 “end =”lead“?> d sub> <=〜5lambda <?in-line-formula description =”In-line Formulas“end =”tail“?>
摘要:
A lithographic apparatus including a radiation attenuator or a variable aperture system, such as masking blades, arranged in or near an intermediate focus of the projection system. Besides a radiation attenuator or a variable aperture system, a measuring system may be arranged in the intermediate focus. By placing one or more of such systems in the intermediate focus of the projection system, instead of near the reticle in the illumination system, fewer design restrictions occur because of more space available, resulting in a lower design cost.
摘要:
A contamination barrier configured to permit radiation from a radiation source to pass through and to capture debris from the radiation source. The contamination barrier includes a support structure, a plurality of plate members arranged on the support structure and extending in a radial direction from an axis of the support structure, and a shield configured to block at least part of the support structure from being hit by radiation or debris from the radiation source.
摘要:
A method of correcting apodization in an optical system includes determining effects of apodization on an intensity distribution of a beam of radiation in a predetermined plane of the optical system; determining a more desirable intensity distribution of the beam of radiation in the predetermined plane such that apodization is corrected for; and absorbing portions of the beam of radiation in the predetermined plane as a function of location such that downstream from the predetermined plane the beam of radiation shows the more desirable intensity distribution. An optical component includes one or more absorbing layers designed to perform the absorption as a function of the location. The optical component may located in the pupil plane of the optical system.