发明申请
- 专利标题: Semiconductor laser device and process for preparing the same
- 专利标题(中): 半导体激光器件及其制备方法
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申请号: US11151552申请日: 2005-06-14
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公开(公告)号: US20060093003A1公开(公告)日: 2006-05-04
- 发明人: Ki Moon , Jong Park , Yu Kim , Hye Oh
- 申请人: Ki Moon , Jong Park , Yu Kim , Hye Oh
- 专利权人: SAMSUNG ELECTRO-MECHANICS CO., LTD.
- 当前专利权人: SAMSUNG ELECTRO-MECHANICS CO., LTD.
- 优先权: KR10-2004-87198 20041029
- 主分类号: H01S5/00
- IPC分类号: H01S5/00
摘要:
Provided are a high output semiconductor laser device that is capable of inhibiting changes in far-field horizontal (FFH) due to increased output thereof, and a process for preparing the same. The semiconductor laser device in accordance with the present invention comprises a first clad layer of a first conductivity type formed on a substrate; an active layer formed on the first clad layer; and a second clad layer of a second conductivity type formed on the active layer and including an upper region having a ridge structure, wherein the second clad layer has at least one high refractivity layer inserted into the ridge structure, the high refractivity layer having a higher refractive index than the second clad layer.
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