发明申请
US20060102591A1 Method and system for treating a substrate using a supercritical fluid
审中-公开
使用超临界流体处理底物的方法和系统
- 专利标题： Method and system for treating a substrate using a supercritical fluid
- 专利标题（中）： 使用超临界流体处理底物的方法和系统
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申请号： US10987067申请日： 2004-11-12
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公开(公告)号： US20060102591A1公开(公告)日： 2006-05-18
- 发明人: Gunilla Jacobson , Marie Lowe , Robert Kevwitch , Brandon Hansen
- 申请人： Gunilla Jacobson , Marie Lowe , Robert Kevwitch , Brandon Hansen
- 专利权人： Tokyo Electron Limited
- 当前专利权人： Tokyo Electron Limited
- 主分类号： B44C1/22
- IPC分类号： B44C1/22 ; H01L21/306
摘要：
A method and system is described for treating a substrate with a supercritical fluid using a high temperature process. For example, when the supercritical fluid includes carbon dioxide in a supercritical state, the high temperature process is performed at temperature approximately equal to and exceeding 80° C., which is greater than the critical temperature of approximately 31 ° C.
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