- 专利标题: Schottky barrier diode and diode array
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申请号: US11272878申请日: 2005-11-15
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公开(公告)号: US20060108659A1公开(公告)日: 2006-05-25
- 发明人: Manabu Yanagihara , Yasuhiro Uemoto , Tsuyoshi Tanaka , Daisuke Ueda
- 申请人: Manabu Yanagihara , Yasuhiro Uemoto , Tsuyoshi Tanaka , Daisuke Ueda
- 专利权人: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
- 当前专利权人: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
- 优先权: JP2004-340531 20041125
- 主分类号: H01L31/07
- IPC分类号: H01L31/07
摘要:
A Schottky barrier diode includes a first semiconductor layer and a second semiconductor layer successively formed above a semiconductor substrate with a buffer layer formed between the first and second semiconductor layers and the semiconductor substrate. A Schottky electrode and an ohmic electrode spaced from each other are formed on the second semiconductor layer, and a back face electrode is formed on the back face of the semiconductor substrate. The Schottky electrode or the ohmic electrode is electrically connected to the back face electrode through a via penetrating through at least the buffer layer.
公开/授权文献
- US07612426B2 Schottky barrier diode and diode array 公开/授权日:2009-11-03
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