发明申请
- 专利标题: Irradiation system with ion beam/charged particle beam
- 专利标题(中): 带离子束/带电粒子束的照射系统
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申请号: US11202101申请日: 2005-08-12
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公开(公告)号: US20060113467A1公开(公告)日: 2006-06-01
- 发明人: Takanori Yagita , Takashi Nishi , Michiro Sugitani , Junichi Murakami , Mitsukuni Tsukihara , Mitsuaki Kabasawa , Masaki Ishikawa , Tetsuya Kudo
- 申请人: Takanori Yagita , Takashi Nishi , Michiro Sugitani , Junichi Murakami , Mitsukuni Tsukihara , Mitsuaki Kabasawa , Masaki Ishikawa , Tetsuya Kudo
- 专利权人: SUMITOMO EATON NOVA CORPORATION
- 当前专利权人: SUMITOMO EATON NOVA CORPORATION
- 优先权: JP2004-346309 20041130
- 主分类号: B01D59/44
- IPC分类号: B01D59/44
摘要:
In an irradiation system with an ion beam/charged particle beam having an energy filter, the energy filter is formed by deflection electrodes and a deflection magnet which can be switchingly used. The deflection magnet has a general window-frame shape and is formed with a hollow portion at its center. The deflection electrodes are installed, along with suppression electrodes, in a vacuum chamber arranged in the hollow portion of the deflection magnet. The deflection electrodes are installed with respect to the deflection magnet such that a deflection trajectory of a beam caused by a magnetic field and a deflection trajectory of a beam caused by an electric field overlap each other. Since the deflection electrodes and the deflection magnet can be switchingly used, the system can deal with a wider range of beam conditions and thus is widely usable.
公开/授权文献
- US07315034B2 Irradiation system with ion beam/charged particle beam 公开/授权日:2008-01-01
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