发明申请
- 专利标题: Method and apparatus for measuring the physical properties of micro region
- 专利标题(中): 测量微区物理性质的方法和装置
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申请号: US11326399申请日: 2006-01-06
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公开(公告)号: US20060113473A1公开(公告)日: 2006-06-01
- 发明人: Yoshifumi Taniguchi , Mikio Ichihashi , Masanari Kouguchi
- 申请人: Yoshifumi Taniguchi , Mikio Ichihashi , Masanari Kouguchi
- 主分类号: G21K7/00
- IPC分类号: G21K7/00
摘要:
A method and apparatus for measuring the physical properties of a micro region measures the two-dimensional distribution of stress/strain in real time at high resolution and sensitivity and with a high level of measuring position matching. A sample is scanned and irradiated with a finely focused electron beam (23, 26), and the displacement of position of a diffraction spot (32, 33) is measured by a two-dimensional position-sensitive electron detector (13). The displacement amount is outputted as a voltage value that is then converted into the magnitude of the stress/strain according to the principle of a nano diffraction method, and the magnitude is displayed in synchronism with a sample position signal.
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