发明申请
- 专利标题： Substrate table, method of measuring a position of a substrate and a lithographic apparatus
- 专利标题（中）： 衬底台，测量衬底位置的方法和光刻设备
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申请号： US10998180申请日： 2004-11-29
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公开(公告)号： US20060114442A1公开(公告)日： 2006-06-01
- 发明人: Henricus Van Buel
- 申请人： Henricus Van Buel
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： G03B27/58
- IPC分类号： G03B27/58
摘要：
The invention relates to a substrate table arranged to support a substrate provided with at least one substrate mark. The at least one substrate mark having a position that can be measured using an alignment system. The substrate table is provided with an optical system having a magnification factor deviating from 1, for providing an image of the at least one alignment mark to be measured by the alignment system.
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