发明申请
- 专利标题: Uniformity correction for lithographic apparatus
- 专利标题(中): 光刻设备的均匀性校正
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申请号: US11007580申请日: 2004-12-09
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公开(公告)号: US20060126036A1公开(公告)日: 2006-06-15
- 发明人: Alexander Kremer , Marcel Mathijs Marie Dierichs , Erik Loopstra
- 申请人: Alexander Kremer , Marcel Mathijs Marie Dierichs , Erik Loopstra
- 申请人地址: NL Vendhoven NL Veldhoven
- 专利权人: ASML NETHERLANDS B.V.,ASML HOLDING NV
- 当前专利权人: ASML NETHERLANDS B.V.,ASML HOLDING NV
- 当前专利权人地址: NL Vendhoven NL Veldhoven
- 主分类号: G03B27/52
- IPC分类号: G03B27/52
摘要:
A uniformity correction module for improving the uniformity of a radiation distribution in a rectangular illumination slit having two longer sides and two shorter sides, including a plurality of movable blades arranged along each long side of the illumination slit and a chamber containing a fluid wherein said movable blades are at least partly immersed in said fluid, and wherein the difference between the refractive index of each blade and the refractive index of said fluid is sufficiently small to prevent significant reflection and refraction at the surface of each blade.
公开/授权文献
- US07362413B2 Uniformity correction for lithographic apparatus 公开/授权日:2008-04-22
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