发明申请
US20060131790A1 Plasma process for removing excess molding material from a substrate 有权
用于从基底去除多余成型材料的等离子体工艺

Plasma process for removing excess molding material from a substrate
摘要:
A method for removing thin layers of a two-component molding material from areas on a substrate. The method includes using a plasma formed using a first gas mixture for removing one component of the molding material and a plasma formed using a different second gas mixture for removing the other component of the molding material. For filled epoxies commonly used as molding materials, the first gas mixture may be an oxygen-rich mixture of an oxygen-containing gas species and a fluorine-containing gas species, and the second gas mixture may be a fluorine-rich mixture of the same gases.
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