发明申请
US20060131790A1 Plasma process for removing excess molding material from a substrate
有权
用于从基底去除多余成型材料的等离子体工艺
- 专利标题: Plasma process for removing excess molding material from a substrate
- 专利标题(中): 用于从基底去除多余成型材料的等离子体工艺
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申请号: US11021341申请日: 2004-12-22
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公开(公告)号: US20060131790A1公开(公告)日: 2006-06-22
- 发明人: James Getty , Jiangang Zhao
- 申请人: James Getty , Jiangang Zhao
- 申请人地址: US OH Westlake
- 专利权人: Nordson Corporation
- 当前专利权人: Nordson Corporation
- 当前专利权人地址: US OH Westlake
- 主分类号: B23K26/38
- IPC分类号: B23K26/38 ; H01S3/00 ; C23F1/00 ; B29C35/08
摘要:
A method for removing thin layers of a two-component molding material from areas on a substrate. The method includes using a plasma formed using a first gas mixture for removing one component of the molding material and a plasma formed using a different second gas mixture for removing the other component of the molding material. For filled epoxies commonly used as molding materials, the first gas mixture may be an oxygen-rich mixture of an oxygen-containing gas species and a fluorine-containing gas species, and the second gas mixture may be a fluorine-rich mixture of the same gases.
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