发明申请
US20060137613A1 Plasma generating apparatus, plasma generating method and remote plasma processing apparatus 审中-公开
等离子体发生装置,等离子体产生方法和远程等离子体处理装置

  • 专利标题: Plasma generating apparatus, plasma generating method and remote plasma processing apparatus
  • 专利标题(中): 等离子体发生装置,等离子体产生方法和远程等离子体处理装置
  • 申请号: US10545399
    申请日: 2004-02-13
  • 公开(公告)号: US20060137613A1
    公开(公告)日: 2006-06-29
  • 发明人: Shigeru Kasai
  • 申请人: Shigeru Kasai
  • 优先权: JP2004-018012 20040127
  • 国际申请: PCT/JP04/01533 WO 20040213
  • 主分类号: C23C16/00
  • IPC分类号: C23C16/00
Plasma generating apparatus, plasma generating method and remote plasma processing apparatus
摘要:
A compact plasma generating apparatus providing high efficiency of plasma excitation is presented. A plasma generating apparatus (100) comprises a microwave generating apparatus (10) for generating microwaves, a coaxial waveguide (20) having a coaxial structure comprising an inner tube (20a) and an outer tube (20b), a monopole antenna (21) being attached to one end of said inner tube (20a), for directing the microwaves generated by said microwave generating apparatus (10) to the monopole antenna (21), a resonator (22) composed of dielectric material for holding the monopole antenna (21), and a chamber (23) in which a specific process gas is fed for plasma excitation. The chamber (23) has an open surface and the resonator (22) is placed on this open surface, and the process gas is excited by the microwaves radiated from the monopole antenna (21) through the resonator (22) into the interior of the chamber (23) to generate plasma.
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