- 专利标题： Biased retaining ring
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申请号： US11003083申请日： 2004-12-02
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公开(公告)号： US20060137819A1公开(公告)日： 2006-06-29
- 发明人: Antoine Manens , Feng Liu , Paul Butterfield , Alain Duboust , Rashid Mavliev
- 申请人： Antoine Manens , Feng Liu , Paul Butterfield , Alain Duboust , Rashid Mavliev
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 主分类号： H01L21/306
- IPC分类号： H01L21/306
摘要：
A retaining ring for electrochemical mechanical processing is described. The ring has a conductive portion having an upper surface and a lower surface and an insulating portion. The insulating portion has one or more openings extending therethrough, exposing the lower surface of the conductive portion. An upper surface of the insulating portion contacts the lower surface of the conductive portion. In an electrochemical mechanical polishing process, the retaining ring can be biased separately from a substrate being polished.
公开/授权文献
- US07608173B2 Biased retaining ring 公开/授权日：2009-10-27
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