发明申请
- 专利标题: Method and apparatus for detecting defects
- 专利标题(中): 检测缺陷的方法和装置
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申请号: US11296290申请日: 2005-12-08
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公开(公告)号: US20060139629A1公开(公告)日: 2006-06-29
- 发明人: Yoshimasa Ohshima , Hisafumi Iwata , Hiroyuki Nakano
- 申请人: Yoshimasa Ohshima , Hisafumi Iwata , Hiroyuki Nakano
- 优先权: JP2004-356415 20041209
- 主分类号: G01N21/88
- IPC分类号: G01N21/88
摘要:
There is disclosed a defect detecting apparatus that focuses a laser beam, irradiates it onto the surface of a sample to be examined, and detects a foreign substance/defect existing on the surface from the scattered light as a result of the irradiation of the beam onto the sample surface. In order to stably detect defects such as foreign substance, the defect detecting apparatus according to the invention is constructed to use a beam shape optical system by which the laser beam emitted from a laser source is shaped to change the illumination intensity from its Gauss distribution to a flat distribution so that the detected signal can be stably produced even if the relative position of a defect/foreign substance to the laser beam irradiation position is changed.
公开/授权文献
- US07426023B2 Method and apparatus for detecting defects 公开/授权日:2008-09-16
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