发明申请
- 专利标题: Projection system for a lithograhic apparatus
- 专利标题(中): 光刻设备投影系统
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申请号: US11019672申请日: 2004-12-23
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公开(公告)号: US20060139745A1公开(公告)日: 2006-06-29
- 发明人: Cheng-Qun Gui , Pieter De Jager , Robert Harned , Nora-Jean Harned
- 申请人: Cheng-Qun Gui , Pieter De Jager , Robert Harned , Nora-Jean Harned
- 申请人地址: NL Veldhoven NL Veldhoven
- 专利权人: ASML Holding N.V.,ASML Netherlands B.V.
- 当前专利权人: ASML Holding N.V.,ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven NL Veldhoven
- 主分类号: G02B7/182
- IPC分类号: G02B7/182
摘要:
A projection system for a lithographic apparatus having a plurality of mirror imaging systems. In an embodiment, the mirror imaging systems are arranged in two rows with each row being perpendicular to a scanning direction of the projection system. Each mirror imaging systems has an associated imaging field. The mirror imaging systems are arranged in a manner that precludes gaps between adjacent imaging fields in the scanning direction. Each mirror imaging system includes a concave mirror and a convex mirror arranged concentrically with the concave mirror. The concave mirrors have a first mirror portion and a second mirror portion that are independently movable. In one embodiment, each of the mirror imaging systems has an associated phase, and the mirror imaging systems in one row are positioned 180 degrees out of phase with the mirror imaging systems in the other row.
公开/授权文献
- US07426076B2 Projection system for a lithographic apparatus 公开/授权日:2008-09-16
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