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公开(公告)号：US08576374B2
公开(公告)日：2013-11-05
申请号：US12393805
申请日：2009-02-26
申请人： Keith Frank Best , Henricus Wilhelmus Maria Van Buel , Cheng-Qun Gui , Johannes Onvlee , Rudy Jan Maria Pellens , Remi Daniel Marie Edart , Oleg Viacheslavovich Voznyi , Pascale Anne Maury
发明人： Keith Frank Best , Henricus Wilhelmus Maria Van Buel , Cheng-Qun Gui , Johannes Onvlee , Rudy Jan Maria Pellens , Remi Daniel Marie Edart , Oleg Viacheslavovich Voznyi , Pascale Anne Maury
CPC分类号： G03F9/7084 , G03F7/70633 , G03F9/7076 , G03F9/708 , H01L23/544 , H01L2223/54453 , H01L2924/0002 , H01L2924/00
摘要： According to a first aspect of the invention, there is provided a lithographic method of providing an alignment mark on a layer provided on a substrate, the method including providing the alignment mark on an area of the layer which is oriented within a certain range of angles with respect to a surface of the substrate on which the layer is provided.
摘要翻译： 根据本发明的第一方面，提供了一种在设置在基板上的层上提供对准标记的光刻方法，所述方法包括在所述层的一定范围内定向的区域上提供对准标记 相对于其上设置有该层的基板的表面。
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公开(公告)号：US08502954B2
公开(公告)日：2013-08-06
申请号：US12469953
申请日：2009-05-21
CPC分类号： G03F7/70875 , G03F7/705
摘要： A lithographic apparatus and method in which a system is used to emit a patterned beam. The patterned beam is projected onto a target portion of the surface of a substrate supported on a substrate support. The target portion has predetermined spatial characteristics relative to the substrate table that are appropriate for a desired exposure pattern on the surface of the substrate. The temperature of the substrate is measured, and the dimensional response of the substrate to the measured temperature is calculated. The spatial characteristics of the target portion relative to the substrate table are adjusted to compensate for the calculated dimensional response.
摘要翻译： 一种光刻设备和方法，其中使用系统来发射图案化的光束。 图案化的光束被投影到支撑在基板支撑件上的基板的表面的目标部分上。 目标部分相对于衬底台具有适合于衬底表面上的期望曝光图案的预定空间特性。 测量衬底的温度，并计算衬底对测量温度的尺寸响应。 调整目标部分相对于衬底台的空间特性以补偿所计算的尺寸响应。
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公开(公告)号：US20120281192A1
公开(公告)日：2012-11-08
申请号：US12741733
申请日：2008-11-03
申请人： Wilhelmus Johannes Maria De Laat , Cheng-Qun Gui , Peter Theodorus Maria Giesen , Marcus Theodoor Wilhelmus Van Der Heijden , Erwin Rinaldo Meinders , Mária Péter
发明人： Wilhelmus Johannes Maria De Laat , Cheng-Qun Gui , Peter Theodorus Maria Giesen , Marcus Theodoor Wilhelmus Van Der Heijden , Erwin Rinaldo Meinders , Mária Péter
CPC分类号： G01B11/306 , G01N2021/95676 , G03F7/703 , G03F7/70783 , G03F7/7085
摘要： A method of obtaining information indicative of the topography of a surface of a flexible substrate, the method including directing a beam of radiation at the surface of the flexible substrate; and detecting changes in intensity distribution, or angle of reflection, of the beam of radiation after the beam of radiation has been reflected from the surface of the substrate to obtain information indicative of the topography of the surface of the flexible substrate.
摘要翻译： 一种获得指示柔性基板的表面的形貌的信息的方法，所述方法包括在柔性基板的表面处引导辐射束; 并且检测在辐射束之后的辐射束的强度分布或反射角度的变化已经从衬底的表面反射，以获得指示柔性衬底的表面的形貌的信息。
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公开(公告)号：US07684009B2
公开(公告)日：2010-03-23
申请号：US11647426
申请日：2006-12-29
IPC分类号： G03B27/52
CPC分类号： G03F7/70275 , G03F7/70291 , G03F7/70916 , G03F7/70983
摘要： A lithographic apparatus and method in which an illumination system supplies a projection beam, a patterning system imparts to the beam a pattern in its cross section, and a projection system projects the patterned beam onto a target portion of a substrate. The projection system comprises an array of lenses spaced from the substrate such that each lens in the array focuses part of the patterned beam onto the substrate. A displacement system causes displacement between the lens array and the substrate. A particle detector detects particles on the substrate which are approaching the lens array. A free working distance control system increases the spacing between the lens array and the substrate in response to detection of a particle. The lens array is moved away from the substrate as the detected particle passes the lens array. Thus damage to the lens array can be avoided.
摘要翻译： 一种光刻设备和方法，其中照明系统提供投影光束，图案化系统在其横截面中赋予光束图案，并且投影系统将图案化的光束投射到基板的目标部分上。 投影系统包括与衬底间隔开的透镜阵列，使得阵列中的每个透镜将图案化束的一部分聚焦到衬底上。 位移系统导致透镜阵列和基板之间的位移。 颗粒检测器检测正在接近透镜阵列的基板上的颗粒。 响应于颗粒的检测，自由工作距离控制系统增加了透镜阵列和基板之间的间隔。 当检测到的颗粒通过透镜阵列时，透镜阵列移动离开基板。 因此可以避免对透镜阵列的损坏。
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公开(公告)号：US07576834B2
公开(公告)日：2009-08-18
申请号：US12113831
申请日：2008-05-01
申请人： Richard Alexander George , Cheng-Qun Gui , Pieter Willem Herman de Jager , Robbert Edgar Van Leeuwen , Jacobus Burghoorn
发明人： Richard Alexander George , Cheng-Qun Gui , Pieter Willem Herman de Jager , Robbert Edgar Van Leeuwen , Jacobus Burghoorn
CPC分类号： G03B27/53 , G03F7/70291 , G03F7/70791 , G03F9/7003 , G03F9/7026
摘要： A lithographic apparatus is provided. The lithographic apparatus includes a radiation source configured to provide radiation, an array of optical light engines, and a substrate table that supports a substrate. Each of the optical light engines includes an array of individually controllable elements arranged and constructed to receive and to pattern the radiation and projection optics configured to receive the patterned radiation and to project the patterned radiation onto the substrate. The substrate table is arranged and constructed to move relative to the array of optical light engines during exposure of the substrate to the patterned radiation.
摘要翻译： 提供光刻设备。 光刻设备包括被配置为提供辐射的辐射源，光学引擎的阵列以及支撑衬底的衬底台。 每个光学引擎包括独立可控元件的阵列，其被布置和构造为接收和图案化配置成接收图案化辐射的辐射和投影光学元件，并将图案化的辐射投射到衬底上。 衬底台布置和构造成在将衬底暴露于图案化辐射期间相对于光学发动机阵列移动。
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公开(公告)号：US07561251B2
公开(公告)日：2009-07-14
申请号：US10811070
申请日：2004-03-29
CPC分类号： G03F7/70875 , G03F7/705
摘要： A lithographic apparatus and method in which a patterning system is used to impart to a projection beam a pattern in its cross-section. The beam is directed by a projection system from an illumination system onto a target portion of the surface of a substrate supported on a substrate support. The target portion has predetermined spatial characteristics relative to the substrate table that are appropriate for a desired exposure pattern on the surface of the substrate. The temperature of the substrate is measured, and the dimensional response of the substrate to the measured temperature is calculated. The spatial characteristics of the target portion relative to the substrate table are adjusted to compensate for the calculated dimensional response.
摘要翻译： 一种光刻设备和方法，其中使用图案化系统以在其横截面中将投影光束赋予图案。 光束由投影系统从照明系统引导到支撑在基板支撑件上的基板的表面的目标部分上。 目标部分相对于衬底台具有适合于衬底表面上的期望曝光图案的预定空间特性。 测量衬底的温度，并计算衬底对测量温度的尺寸响应。 调整目标部分相对于衬底台的空间特性以补偿所计算的尺寸响应。
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公开(公告)号：US07477403B2
公开(公告)日：2009-01-13
申请号：US10854770
申请日：2004-05-27
申请人： Cheng-Qun Gui , Fransiscus Godefridus Casper Bijnen , Johan Christiaan Gerard Hoefnagels , Pieter Willem Herman de Jager , Joannes Theodoor de Smit
发明人： Cheng-Qun Gui , Fransiscus Godefridus Casper Bijnen , Johan Christiaan Gerard Hoefnagels , Pieter Willem Herman de Jager , Joannes Theodoor de Smit
CPC分类号： G03F7/70275 , G03F9/7088
摘要： An optical position assessment apparatus and method has an illumination system that supplies an alignment beam of radiation, and positional data is derived from reflections of the alignment beam. A substrate is supported on a substrate table and a projection system is used to project the alignment beam onto a target portion of the substrate. A positioning system causes relative movement between the substrate and the projection system. An array of lenses is arranged such that each lens in the array focuses a respective portion of the alignment beam onto a respective part of the target portion. An array of detectors is arranged such that each detector in the array detects light reflected from the substrate through a respective lens in the array and provides an output representative of the intensity of light reflected to it from the substrate through the respective lens. A processor is connected to the outputs of the detectors for deriving data representing the position of the lens array relative to the substrate from the outputs of the detectors.
摘要翻译： 光学位置评估装置和方法具有照射系统，其提供对准的辐射束，并且位置数据源自对准光束的反射。 基板被支撑在基板台上，并且使用投影系统将对准光束投影到基板的目标部分上。 定位系统引起基板和投影系统之间的相对移动。 透镜阵列被布置成使得阵列中的每个透镜将对准光束的相应部分聚焦到目标部分的相应部分上。 一组检测器被布置成使得阵列中的每个检测器通过阵列中的相应透镜来检测从基板反射的光，并且通过相应的透镜提供代表从基板反射的光的强度的输出。 处理器连接到检测器的输出，用于从检测器的输出导出表示透镜阵列相对于基板的位置的数据。
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公开(公告)号：US07440081B2
公开(公告)日：2008-10-21
申请号：US10981729
申请日：2004-11-05
CPC分类号： G03F7/707 , G03F7/70783
摘要： A lithographic apparatus includes an illumination system to supply a beam of radiation, a patterning system serving to impart the beam of radiation with a pattern in its cross-section, a substrate table to support a substrate, and a projection system to project the patterned beam onto a target portion of the substrate. The substrate table includes a support member having an upper support surface for supporting at least part of the target portion of the substrate on a fluid cushion. The apparatus further includes a fluid supply system arranged to supply fluid to the upper support surface so as to provide the cushion, and an actuator system arranged to act on the support member. The actuator system is controllable to provide adjustment of a topography of the upper support surface relative to a reference plane. Compensation can thus be made for substrate thickness irregularities, to achieve correct focusing of the beam onto the target surface.
摘要翻译： 光刻设备包括用于提供辐射束的照明系统，用于使辐射束在其横截面上具有图案的图案化系统，用于支撑衬底的衬底台，以及用于将图案化的射束投影的投影系统 到基板的目标部分上。 衬底台包括具有用于将衬底的目标部分的至少一部分支撑在流体衬垫上的上支撑表面的支撑构件。 该装置还包括流体供应系统，该流体供应系统布置成将流体供应到上部支撑表面以便提供缓冲垫，以及布置成作用在支撑构件上的致动器系统。 致动器系统是可控制的，以提供相对于参考平面调整上支撑表面的形貌。 因此可以对衬底厚度不规则进行补偿，以实现光束到目标表面的正确聚焦。
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公开(公告)号：US07388663B2
公开(公告)日：2008-06-17
申请号：US10975183
申请日：2004-10-28
申请人： Cheng-Qun Gui
发明人： Cheng-Qun Gui
IPC分类号： G01B11/00
CPC分类号： G03F9/7088 , G03F7/70216 , G03F7/70425
摘要： A lithographic apparatus comprises a substrate table that supports a substrate having alignment marks on a surface thereof. The apparatus further comprises a frame moveable relative to the substrate to provide for a scanning or stepping mode of operation. An array of projection systems is disposed across the frame for projecting respective patterned beams onto a target portion of the substrate. A plurality of alignment mark detectors are attached to the frame and are moveable with respect to the frame using respective linear drive mechanisms. A position sensor is associated with each alignment mark detector for determining the position of the detector relative to the frame. A control system is responsible for both initial positioning of the detectors above alignment mark patterns on the substrate, and for dynamic alignment of the frame and substrate during a lithographic process.
摘要翻译： 光刻设备包括：支撑其表面上具有对准标记的基板的基板台。 该装置还包括相对于基板可移动的框架，以提供扫描或步进操作模式。 投影系统阵列横跨框架布置，用于将相应的图案化光束投射到基板的目标部分上。 多个对准标记检测器附接到框架并且可以使用相应的线性驱动机构相对于框架移动。 位置传感器与每个对准标记检测器相关联，用于确定检测器相对于框架的位置。 控制系统负责将检测器初始定位在基板上的对准标记图案之上，并且用于在光刻工艺期间框架和基板的动态对准。
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公开(公告)号：US20080117402A1
公开(公告)日：2008-05-22
申请号：US11642987
申请日：2006-12-21
IPC分类号： G03B27/58
CPC分类号： H01L21/6835 , H01L21/67115 , H01L24/80 , H01L2924/01005 , H01L2924/01006 , H01L2924/01033 , H01L2924/01061 , H01L2924/01074 , H01L2924/01078 , H01L2924/01082 , H01L2924/014 , H01L2924/14 , H01L2924/3025 , H01L2924/00
摘要： In an embodiment, a ring seal forming apparatus is disclosed, the apparatus including a substrate holder arranged to hold a substrate coated at least in part with resist, and a heating device configured to heat an area of the resist, relative movement between the substrate holder and heating device being possible, the movement being arranged such that, in use of the apparatus, the area of resist heated by the heating device is ring-shaped.
摘要翻译： 在一个实施例中，公开了一种环形密封形成装置，该装置包括：衬底保持器，其被布置成保持至少部分地涂覆有抗蚀剂的衬底;以及加热装置，其构造成加热抗蚀剂的区域，衬底保持器 并且加热装置是可能的，所述运动被布置成使得在使用该装置时，由加热装置加热的抗蚀剂的面积是环形的。
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