- 专利标题： Silicon electrode assembly surface decontamination by acidic solution
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申请号： US11019726申请日： 2004-12-23
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公开(公告)号： US20060141802A1公开(公告)日： 2006-06-29
- 发明人: Hong Shih , Tuochuan Huang , Chunhong Zhou
- 申请人： Hong Shih , Tuochuan Huang , Chunhong Zhou
- 专利权人： Lam Research Corporation
- 当前专利权人： Lam Research Corporation
- 主分类号： H01L21/302
- IPC分类号： H01L21/302
摘要：
Methods for cleaning silicon surfaces of electrode assemblies by efficiently removing contaminants from the silicon surfaces without discoloring the silicon surfaces using an acidic solution comprising hydrofluoric acid, nitric acid, acetic acid, and balance deionized water.
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