发明申请
US20060144338A1 High accuracy vapor generation and delivery for thin film deposition
审中-公开
用于薄膜沉积的高精度蒸汽发生和输送
- 专利标题： High accuracy vapor generation and delivery for thin film deposition
- 专利标题（中）： 用于薄膜沉积的高精度蒸汽发生和输送
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申请号： US11322475申请日： 2005-12-30
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公开(公告)号： US20060144338A1公开(公告)日： 2006-07-06
- 发明人: Benjamin Liu , Yamin Ma
- 申请人： Benjamin Liu , Yamin Ma
- 申请人地址： US MN Shoreview
- 专利权人： MSP Corporaton
- 当前专利权人： MSP Corporaton
- 当前专利权人地址： US MN Shoreview
- 主分类号： C23C16/00
- IPC分类号： C23C16/00 ; H01L21/31
摘要：
The present invention involves injecting a liquid and gas into a vapor holding chamber held at a sufficiently high temperature to insure all the liquid injected is vaporized and held in the chamber as a vapor. The gas/vapor mixture is then delivered to the deposition chamber in which the deposition substrate is held.
信息查询
IPC分类:
