发明申请
- 专利标题: Organic semiconductor device and its manufacturing method
- 专利标题(中): 有机半导体器件及其制造方法
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申请号: US10526075申请日: 2003-08-26
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公开(公告)号: US20060145139A1公开(公告)日: 2006-07-06
- 发明人: Kenji Nakamura , Satoru Ohta
- 申请人: Kenji Nakamura , Satoru Ohta
- 申请人地址: JP Tokyo
- 专利权人: PIONEER CORPORATION
- 当前专利权人: PIONEER CORPORATION
- 当前专利权人地址: JP Tokyo
- 优先权: JP2002-255279 20020830
- 国际申请: PCT/JP03/10724 WO 20030826
- 主分类号: H01L29/08
- IPC分类号: H01L29/08
摘要:
There are provided an organic semiconductor device and a method of manufacturing the same, which make it possible to easily form a dense polymeric insulating film with high insulating properties as a gate insulating film, without using a vacuum apparatus, and to dispense with the step of patterning the gate insulating film. Gate electrodes 12 are formed on a glass substrate 11. Then, poly(1,4-bis(2-methylstyryl)benzene) (bis-MSB) is dissolved in benzonitrile containing 0.1 mol/l of tetrabutylammonium tetrafluoroborate, whereafter the glass substrate 11 having the gate electrodes 12 formed thereon is soaked in the solution to thereby form dense poly(bis-MSB) films by electrochemical polymerization.
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