发明申请
- 专利标题： Plasma display panel and substrate
- 专利标题（中）： 等离子显示面板和基板
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申请号： US11262939申请日： 2005-11-01
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公开(公告)号： US20060145610A1公开(公告)日： 2006-07-06
- 发明人: Syuma Eifuku , Toshiyuki Nanto , Nobuhiro Iwase , Tetsurou Kawakita
- 申请人： Syuma Eifuku , Toshiyuki Nanto , Nobuhiro Iwase , Tetsurou Kawakita
- 申请人地址： JP Kawasaki
- 专利权人： FUJITSU HITACHI PLASMA DISPLAY LIMITED
- 当前专利权人： FUJITSU HITACHI PLASMA DISPLAY LIMITED
- 当前专利权人地址： JP Kawasaki
- 优先权： JP2004-322236 20041105
- 主分类号： H01J17/49
- IPC分类号： H01J17/49
摘要：
A panel structure is provided in which a dielectric layer having no voids thereinside can be formed by a vapor deposition method. A layered film of plural metal layers that constitute an electrode covered with a dielectric layer is formed to have a stepped shape in which a width is smaller from a bottom layer to an uppermost layer for each layer in order. The stepped shape is formed by projecting an edge portion of a lower layer by design compared to an upper layer.
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