发明申请
US20060157697A1 System and method for adjusting a manufacturing condition of an electronic device and method for manufacturing an electronic device
审中-公开
用于调整电子设备的制造条件的系统和方法以及用于制造电子设备的方法
- 专利标题： System and method for adjusting a manufacturing condition of an electronic device and method for manufacturing an electronic device
- 专利标题（中）： 用于调整电子设备的制造条件的系统和方法以及用于制造电子设备的方法
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申请号： US11232851申请日： 2005-09-23
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公开(公告)号： US20060157697A1公开(公告)日： 2006-07-20
- 发明人: Hajime Nagano
- 申请人： Hajime Nagano
- 优先权： JPP2004-285528 20040929
- 主分类号： H01L21/66
- IPC分类号： H01L21/66 ; H01L23/58 ; G01R31/26
摘要：
A system for adjusting a manufacturing condition of an electronic device includes: an inspection tool configured to inspect a plurality of protrusions on a substance layer for manufacturing an electronic device; a height calculation unit configured to calculate each of heights of the protrusions, based on the inspection result; and an adjustment unit configured to adjust a manufacturing condition of the electronic device in order to remove the protrusions, based on the heights.
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IPC分类:
