发明申请
US20060163207A1 Substrate treating apparatus and substrate treating method using the same 审中-公开
基板处理装置及使用其的基板处理方法

Substrate treating apparatus and substrate treating method using the same
摘要:
Disclosed is a substrate treating apparatus including a treatment solution dispenser supplying a treatment solution on a substrate, a transporting unit transporting the substrate, and a controller controlling the transporting unit so that the substrate is transported in an inclined position. The substrate is inclined sideways through a rotation with respect to an axis extending parallel to a transportation direction of the substrate. The rotation may be made in both directions in an alternating manner. The apparatus is useful for treating the substrate uniformly regardless of substrate size.
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