发明申请
US20060172229A1 Alignment system used in nano-imprint lithography and nano imprint lithography method using the alignment system
审中-公开
对准系统用于纳米压印光刻和纳米压印光刻法使用对准系统
- 专利标题： Alignment system used in nano-imprint lithography and nano imprint lithography method using the alignment system
- 专利标题（中）： 对准系统用于纳米压印光刻和纳米压印光刻法使用对准系统
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申请号： US11340696申请日： 2006-01-27
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公开(公告)号： US20060172229A1公开(公告)日： 2006-08-03
- 发明人: Sang-jun Choi , Jung-hyun Lee , Suk-won Lee , Moon-gu Lee
- 申请人： Sang-jun Choi , Jung-hyun Lee , Suk-won Lee , Moon-gu Lee
- 申请人地址： KR Suwon-si
- 专利权人： Samsung Electronics Co., Ltd.
- 当前专利权人： Samsung Electronics Co., Ltd.
- 当前专利权人地址： KR Suwon-si
- 优先权： KR10-2005-0008749 20050131
- 主分类号： H01L21/00
- IPC分类号： H01L21/00 ; G03C5/00
摘要：
An alignment system used in nano-imprint lithography and a nano-imprint lithography method using the alignment system are provided. The alignment system includes: a plurality of electron emission devices, which are provided in the mold and emit electrons; and a plurality of electrodes, which are provided to face the electron emission devices and at which the electrons emitted from the electron emission devices arrive. The mold and the substrate are aligned with each other by maximizing the amount of current in each of the electrodes.
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