- 专利标题: Vacuum process system
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申请号: US11332653申请日: 2006-01-13
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公开(公告)号: US20060182539A1公开(公告)日: 2006-08-17
- 发明人: Jun Ozawa , Jun Hirose , Masaki Narushima
- 申请人: Jun Ozawa , Jun Hirose , Masaki Narushima
- 申请人地址: JP Tokyo
- 专利权人: TOKYO ELECTRON LIMITED
- 当前专利权人: TOKYO ELECTRON LIMITED
- 当前专利权人地址: JP Tokyo
- 优先权: JP10-343596 19981117; JP10-369138 19981225
- 主分类号: H01L21/677
- IPC分类号: H01L21/677
摘要:
A vacuum process system comprises: a load port on which an object to be processed is set; a common transfer chamber disposed adjacent to the load port, having an internal space set at an atmospheric pressure level, and including a first transfer device that is movable and transfers the object into/from the load port, the first transfer device being disposed within the internal space; and a process unit having one process chamber for subjecting the object to a predetermined process, and a vacuum transfer chamber connected to the process chamber, having an internal space set at a vacuum pressure level, and including a second transfer device for transferring the object into/from the process chamber, the second transfer device being disposed within the internal space. The process units are individually connected to the common transfer chamber such that the process units are substantially parallel to each other. The vacuum chamber of each process unit is connected to the common transfer chamber. Each process unit extends linearly in a direction substantially perpendicular to the common transfer chamber. The object is transferred into/from the vacuum transfer chamber by means of the first transfer device.
公开/授权文献
- US07198448B2 Vacuum process system 公开/授权日:2007-04-03
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