发明申请
US20060186497A1 Photoelectric Conversion Device and Manufacturing Method of the Same, and a Semiconductor Device 有权
光电转换装置及其制造方法以及半导体装置

Photoelectric Conversion Device and Manufacturing Method of the Same, and a Semiconductor Device
摘要:
It is an object of the present invention to provide a photo-sensor having a structure which can suppress electrostatic discharge damage. Conventionally, a transparent electrode has been formed over the entire surface of a light receiving region; however, in the present invention, the transparent electrode is not formed, and a p-type semiconductor layer and an n-type semiconductor layer of a photoelectric conversion layer are used as an electrode. Therefore, in the photo-sensor according to the present invention, resistance is increased and electrostatic discharge damage can be suppressed. In addition, positions of the p-type semiconductor layer and the n-type semiconductor layer, which serve as an electrode, are kept away; and thus, resistance is increased and withstand voltage can be improved.
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