发明申请
- 专利标题: Photoelectric Conversion Device and Manufacturing Method of the Same, and a Semiconductor Device
- 专利标题(中): 光电转换装置及其制造方法以及半导体装置
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申请号: US11276036申请日: 2006-02-10
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公开(公告)号: US20060186497A1公开(公告)日: 2006-08-24
- 发明人: Kazuo Nishi , Yuusuke Sugawara , Hironobu Takahashi , Tatsuya Arao
- 申请人: Kazuo Nishi , Yuusuke Sugawara , Hironobu Takahashi , Tatsuya Arao
- 申请人地址: JP Atsugi-shi
- 专利权人: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
- 当前专利权人: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
- 当前专利权人地址: JP Atsugi-shi
- 优先权: JP2005042926 20050218; JP2005121392 20050419
- 主分类号: H01L27/14
- IPC分类号: H01L27/14
摘要:
It is an object of the present invention to provide a photo-sensor having a structure which can suppress electrostatic discharge damage. Conventionally, a transparent electrode has been formed over the entire surface of a light receiving region; however, in the present invention, the transparent electrode is not formed, and a p-type semiconductor layer and an n-type semiconductor layer of a photoelectric conversion layer are used as an electrode. Therefore, in the photo-sensor according to the present invention, resistance is increased and electrostatic discharge damage can be suppressed. In addition, positions of the p-type semiconductor layer and the n-type semiconductor layer, which serve as an electrode, are kept away; and thus, resistance is increased and withstand voltage can be improved.
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