发明申请
- 专利标题: Apparatus for the formation of a metal film
- 专利标题(中): 用于形成金属膜的装置
-
申请号: US11391241申请日: 2006-03-29
-
公开(公告)号: US20060191481A1公开(公告)日: 2006-08-31
- 发明人: Hitoshi Sakamoto , Toshihiko Nishimori , Saneyuki Goya , Takao Abe , Noriaki Ueda
- 申请人: Hitoshi Sakamoto , Toshihiko Nishimori , Saneyuki Goya , Takao Abe , Noriaki Ueda
- 申请人地址: JP Tokyo
- 专利权人: MITSUBISHI HEAVY INDUSTRIES, LTD.
- 当前专利权人: MITSUBISHI HEAVY INDUSTRIES, LTD.
- 当前专利权人地址: JP Tokyo
- 优先权: JP2000-320136 20001020; JP2000-161507 20000531; JP2000-108120 20000410; JP2000-085511 20000327
- 主分类号: C23C16/00
- IPC分类号: C23C16/00
摘要:
An apparatus for forming a metal film, including a reaction vessel for housing a substrate, a precursor feeding device for bubbling a carrier gas through a liquid organometallic complex, vaporizing the organometallic complex, producing a precursor from the vaporized organometallic complex, and feeding the precursor into the reaction vessel, a rotating magnetic field generator for creating a rotating magnetic field in a space above the substrate, and a second plasma generator for generating a plasma from a reducing gas fed into the reaction vessel.
信息查询
IPC分类: