• 专利标题: Electrochemical etching
  • 申请号: US11081762
    申请日: 2005-03-15
  • 公开(公告)号: US20060207890A1
    公开(公告)日: 2006-09-21
  • 发明人: Norbert Staud
  • 申请人: Norbert Staud
  • 主分类号: C25F3/02
  • IPC分类号: C25F3/02
Electrochemical etching
摘要:
Methods to etch a workpiece are described. In one embodiment, a workpiece is disposed within an etchant solution having a composition comprising a dilute acid and a non-ionic surfactant. An electric field is generated within the etchant solution to cause an anisotropic etch pattern to form on a surface of the workpiece.
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