- 专利标题: Color filter substrate manufacturing method
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申请号: US11439308申请日: 2006-05-24
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公开(公告)号: US20060211164A1公开(公告)日: 2006-09-21
- 发明人: Satoru Katagami , Kunio Maruyama , Keiji Takizawa , Hisashi Aruga
- 申请人: Satoru Katagami , Kunio Maruyama , Keiji Takizawa , Hisashi Aruga
- 申请人地址: JP Shinjyuku-ku
- 专利权人: Seiko Epson Corporation
- 当前专利权人: Seiko Epson Corporation
- 当前专利权人地址: JP Shinjyuku-ku
- 优先权: JP2003-318438 20030910
- 主分类号: H01L21/00
- IPC分类号: H01L21/00
摘要:
A method of manufacturing a color filter substrate includes providing a base, forming a reflective film over the base, forming a plurality of banks on the reflective film between such that at least one of the banks has a transmissive portion and a non-transmissive portion, and forming a plurality of coloring elements by depositing prescribed fluid in a plurality of deposit portions that are defined by the banks such that the coloring elements have at least two different colors and are disposed so as to form a prescribed pattern.
公开/授权文献
- US07542111B2 Color filter substrate manufacturing method 公开/授权日:2009-06-02
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