发明申请
- 专利标题： METHODS FOR CONTROLLING FORMATION OF DEPOSITS IN A DEPOSITION SYSTEM AND DEPOSITION METHODS INCLUDING THE SAME
- 专利标题（中）： 用于控制沉积系统中沉积物形成的方法和包括其的沉积方法
-
申请号： US10414787申请日： 2003-04-16
-
公开(公告)号： US20060216416A1公开(公告)日： 2006-09-28
- 发明人: Joseph Sumakeris , Michael Paisley , Michael O'Loughlin
- 申请人： Joseph Sumakeris , Michael Paisley , Michael O'Loughlin
- 主分类号： C23C16/00
- IPC分类号： C23C16/00
摘要：
A method for controlling parasitic deposits in a deposition system for depositing a film on a substrate, the deposition system defining a reaction chamber for receiving the substrate and including a process gas in the reaction chamber and an interior surface contiguous with the reaction chamber, includes flowing a buffer gas between the interior surface and at least a portion of the process gas to form a gas barrier layer such that the gas barrier layer inhibits contact between the interior surface and components of the process gas.
公开/授权文献
信息查询
IPC分类:
