发明申请
US20060222233A1 Pattern defect inspection method and apparatus using image correction technique
审中-公开
图案缺陷检查方法和使用图像校正技术的装置
- 专利标题: Pattern defect inspection method and apparatus using image correction technique
- 专利标题(中): 图案缺陷检查方法和使用图像校正技术的装置
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申请号: US11386744申请日: 2006-03-23
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公开(公告)号: US20060222233A1公开(公告)日: 2006-10-05
- 发明人: Shinji Sugihara , Junji Oaki
- 申请人: Shinji Sugihara , Junji Oaki
- 申请人地址: JP Kawasaki-shi
- 专利权人: Advanced Mask Inspection Technology Inc.
- 当前专利权人: Advanced Mask Inspection Technology Inc.
- 当前专利权人地址: JP Kawasaki-shi
- 优先权: JP2005-095464 20050329
- 主分类号: G06K9/00
- IPC分类号: G06K9/00
摘要:
An image correction method employable in a pattern inspection method for emitting light falling onto a workpiece with a pattern formed thereon and for inspecting a pattern image resulting from the pickup of an optical image of the workpiece by comparing it to a corresponding fiducial pattern image is disclosed. The method includes the step of generating a system of equations describing therein an input/output relation using a 2D linear prediction model(s) with respect to the pattern image being tested and the fiducial pattern image. Then, estimate the equation system by least-squares methods to thereby obtain a parameter of the equation system. Next obtain a centroid of the parameter. Then perform interpolation using the value of the centroid, thereby to generate a corrected image. A pattern defect inspection method using the image correction method is also disclosed.