• 专利标题: Thin film transistor and method of fabricating the same
  • 申请号: US11397556
    申请日: 2006-04-05
  • 公开(公告)号: US20060226424A1
    公开(公告)日: 2006-10-12
  • 发明人: Gee-Sung ChaeMi-Kyung Park
  • 申请人: Gee-Sung ChaeMi-Kyung Park
  • 优先权: KR10-2005-0029120 20050407
  • 主分类号: H01L29/04
  • IPC分类号: H01L29/04
Thin film transistor and method of fabricating the same
摘要:
A thin film transistor includes: a silicon nanowire on a substrate, the silicon nanowire having a central portion and both side portions of the central portion; a gate electrode on the central portion; and a source electrode and a drain electrode spaced apart from the source electrode on the both side portions, the source electrode and the drain electrode electrically connected to the silicon nanowire, respectively.
信息查询
0/0