发明申请
- 专利标题: Lithographic apparatus and device manufacturing method
- 专利标题(中): 平版印刷设备和器件制造方法
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申请号: US11384824申请日: 2006-03-21
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公开(公告)号: US20060227310A1公开(公告)日: 2006-10-12
- 发明人: Erik Buurman , Thomas Castenmiller , Johannes Wilhelmus Teeuwsen , Bearrach Moest , Marc Haast
- 申请人: Erik Buurman , Thomas Castenmiller , Johannes Wilhelmus Teeuwsen , Bearrach Moest , Marc Haast
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 主分类号: G03F7/00
- IPC分类号: G03F7/00
摘要:
A method and apparatus make use of data representing changes in wavelength of a radiation source to provide control of focal plane position or to provide correction of sensor data. In the first aspect, the wavelength variation data is provided to control systems that control focus by moving apparatus components including, for example, the mask table, the substrate table or optical elements of the projection optical system. In the second aspect, variation data is used in correcting, e.g., focal plane position data measured by an inboard sensor, such as a transmitted image sensor. The two aspects may be combined in a single apparatus or may be used separately.
公开/授权文献
- US07655367B2 Lithographic apparatus and device manufacturing method 公开/授权日:2010-02-02
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