发明申请
US20060229451A1 Process for producing high purity 3,5-dihydroxy-6-heptenoic acid derivative
失效
高纯度3,5-二羟基-6-庚烯酸衍生物的制备方法
- 专利标题: Process for producing high purity 3,5-dihydroxy-6-heptenoic acid derivative
- 专利标题(中): 高纯度3,5-二羟基-6-庚烯酸衍生物的制备方法
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申请号: US10568347申请日: 2004-09-22
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公开(公告)号: US20060229451A1公开(公告)日: 2006-10-12
- 发明人: Yuji Yoshimura , Masami Yasukawa , Syuji Morikiyo , Yasutaka Takada , Hiroo Matsumoto
- 申请人: Yuji Yoshimura , Masami Yasukawa , Syuji Morikiyo , Yasutaka Takada , Hiroo Matsumoto
- 优先权: JP2003-346019 20031003
- 国际申请: PCT/JP04/14289 WO 20040922
- 主分类号: C07D215/14
- IPC分类号: C07D215/14
摘要:
A process for producing a high purity 3,5-dihydroxy6-heptenoic acid derivative by controlling the content of impurities such as denatured substances, is provided. When a 3,5-dihydroxy-6-heptenoic acid derivative is produced by a process which comprises a step of contacting the 3,5-dihydroxy-6-heptenoic acid derivative of the formula (1) wherein R is a C1-4 alkyl group, with a C1-4 lower alcohol-containing solvent, an alcohol containing solvent having its content of an oxidizing substance lowered, is used to at most 0.05 molar equivalent to a 3,5-dihydroxy-6-heptenoic acid derivative, to suppress impurities contained in the 3,5-dihydroxy-6heptenoic acid derivative.
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