发明申请
- 专利标题： Methods and apparatus for cleaning an edge of a substrate
- 专利标题（中）： 用于清洁衬底边缘的方法和设备
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申请号： US11411012申请日： 2006-04-24
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公开(公告)号： US20060243304A1公开(公告)日： 2006-11-02
- 发明人: Wei-Yung Hsu , Donald Olgado , Ho Shin , Liang-Yuh Chen
- 申请人： Wei-Yung Hsu , Donald Olgado , Ho Shin , Liang-Yuh Chen
- 专利权人： APPLIED MATERIALS, INC.
- 当前专利权人： APPLIED MATERIALS, INC.
- 主分类号： B08B7/00
- IPC分类号： B08B7/00 ; B08B5/04
摘要：
In one aspect, a method for cleaning an edge of a substrate is provided. The method includes the steps of (a) supporting a substrate on a rotatable substrate support; (b) contacting an edge of the substrate with one or more rollers; (c) rotating the substrate support so as to rotate the substrate; and (d) rotating the one or more rollers so as to clean the edge of the substrate Numerous other aspects are provided.
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