发明申请
US20060246378A1 Photolithographic process, stamper, use of said stamper and optical data storage medium
审中-公开
光刻工艺，压模，使用所述压模和光学数据存储介质
- 专利标题： Photolithographic process, stamper, use of said stamper and optical data storage medium
- 专利标题（中）： 光刻工艺，压模，使用所述压模和光学数据存储介质
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申请号： US10553720申请日： 2004-04-22
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公开(公告)号： US20060246378A1公开(公告)日： 2006-11-02
- 发明人: Jacobus Neijzen , Helmar Van Santen
- 申请人： Jacobus Neijzen , Helmar Van Santen
- 优先权： EP03101104.2 20030423
- 国际申请： PCT/IB04/50480 WO 20040422
- 主分类号： G03F7/26
- IPC分类号： G03F7/26
摘要：
A photolithographic process is described. It comprises the steps of: applying a photoresist layer (2) on a substrate (1), locally exposing the photoresist layer (2) to a radiation source with a suitable wavelength, providing a suitable liquid developer composition on the substrate (1), dissolving an exposed or unexposed region of the photoresist layer (2) with the developer composition, rinsing and drying the photoresist layer (2) thereby interrupting said dissolving step. The substrate (1) has a metallic surface (1c) in contact with the photoresist layer (2) and the photoresist layer (2) has a thickness dr
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